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X-ray gratings

1. X-ray imaging by Talbot Interferometry and Talbot-Lau Interferometry

(a) Multi X-ray modal imaging

Using X-ray Talbot interferometer, in addition to ordinary X-ray absorption images, differential phase contrast images and visibility contrast (dark field or small-angle scattering contrast) images can be obtained on one set-up, which allows you to get far more information from the sample.


Examples of images taken by an X-ray Talbot interferometer. Conventional X-ray image (absorption, centre), small-angle scattering or visibility contrast image (right) and differential phase contrast image can be obtained.


(b) Talbot interferometer set-up with X-ray gratings

Talbot interferometer (with an SR source or micro focus X-ray source)


The self-image of G1 is generated at a Talbot distance when coherent X-ray is exposed to G1. Positioning a G2 where the self-image appears, one can observe moiré fringes


Talbot-Lau interferometer (with an X-ray tube)


Adding another absorption grating in front of the source, the X-ray Talbot-Lau interferometer can be set up using an ordinary X-ray tube source.


(c) X-ray gratings

ASICON Tokyo Ltd. provides you with high precision and high aspect ratio X-ray gratings manufactured by Karlsruhe Institute of Technology (KIT) and its spin-off company microworks GmbH.


Left: High aspect ratio absorption grating.

Right: Bent absorption grating to avoid shadow effects. Provided mounted on a holder.

2. X-ray gratings from Karlsruhe, Germany

(a) Grating structure examples

X-ray gratings are made by copying the structure of an X-ray mask on resist on a substrate, followed by electroplating done between the gaps of the exposed resist lamellae. Grating layout designs can be chosen from existing mask designs or can be newly made for your own set-up.

Metal height (examples)200 μm4.0 μm
Period (metal + space)4.8 μm3.57 μm
MaterialAuNi
Can be used as G0, G2G1

Examples of existing period designs, subject to change



(b) Grating standard specifications

Examples of grating specifications and some options which do no require special development.

Absorber / Phase shift materialAu, Ni or polymer resist
ResistSU-8
Substrate Standard: Si wafer (200 or 550 µm)
Options: Low X-ray absorption materials like graphite, glassy carbon, polyimide membrane. Mounting on a holder.
Structured area Standard: 50 mm x 50 mm,70 mm diameter.
Options: 100-140 mm diameter. Large area by stitching some plates.

3. Manufacturers

Karlsruhe Institute of Technology (KIT)/IMT and its spin-off company microworks GmbH have a long experience in LIGA micro fabrication technology and have applied it to manufacture X-ray optic products. ASICON Tokyo Ltd. serves as their local distributor in Japan, South Korea and Taiwan.

X-ray optic products brochure

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